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- W2084457549 abstract "The factors influencing electron beam sensitivity are reviewed. The variation of electron beam sensitivity and constrast are reported for a series of random copolymers of styrene and methyl methacrylate. Data are also presented for an alternating copolymer of styrene and methyl methacrylate. This study indicates the effects which arise when a negative resist material, polystyrene, is incorporated into a positive resist material, poly(methyl methacrylate)." @default.
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- W2084457549 date "1983-04-01" @default.
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- W2084457549 title "Copolymer electron resists: poly(stryene-methyl methacrylate) copolymers" @default.
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- W2084457549 doi "https://doi.org/10.1016/0032-3861(83)90022-8" @default.
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