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- W2084691679 abstract "Surface hydrogen and growth mechanisms are investigated for synchrotron radiation (SR)-assisted gas source molecular beam epitaxy (SR-GSMBE) using Si2H6 on the Si(100) surface in the low-temperature region. The surface silicon hydrides (deuterides) are monitored in situ during the epitaxial growth by means of infrared reflection absorption spectroscopy with a Si(100) substrate and a CoSi2 buried metal layer. It is concluded that the chemisorption of gas-phase reactive species such as SiHn and H generated by SR irradiation and the subsequent hydrogen desorption are the key mechanisms of SR-GSMBE at low substrate temperatures. © 1998 John Wiley & Sons, Ltd." @default.
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- W2084691679 date "1998-04-01" @default.
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- W2084691679 title "Surface hydrogen and growth mechanisms of synchrotron radiation-assisted silicon gas source molecular beam epitaxy using disilane" @default.
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- W2084691679 doi "https://doi.org/10.1002/(sici)1099-0739(199804)12:4<253::aid-aoc701>3.0.co;2-n" @default.
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