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- W2085013111 abstract "The effects of H2- and HF- on SiC{0001} surfaces interms of morphology and adsorbates have been investigated. High temperature annealing in a H2 ambient produces a flat surface without macro-step bunching for on-axis 6H-SiC(0001) and 8° off 4H-SiC(0001). Fourier-transformed infrared attenuated total reflection (FTIR-ATR) spectra show that surface Si-H bonds are formed on 6H-SiC(0001) and surface C-H bonds are formed on SiC(000¯1) by H2 treatments. The sequence of thermal oxidation and HF etching also produces on-axis 6H-SiC(0001) with a stepped morphology; however, the density of surface Si-H bonds on the SiC(0001) surface after this treatment is lower than our detection limit. The chemical characteristics of surface Si-H bonds on SiC(0001) formed by H2 treatment has also been discussed." @default.
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- W2085013111 date "2000-01-01" @default.
- W2085013111 modified "2023-09-25" @default.
- W2085013111 title "The Effects of H2 and HF Treatments on SiC Surfaces." @default.
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- W2085013111 doi "https://doi.org/10.1380/jsssj.21.784" @default.
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