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- W2085087476 abstract "The lower temperature dependence of the phosphorus incorporation with the use of phosphine together with chlorosilanes (ΔH = −13 to −15 kcal/ mole) instead of silane (ΔH = −43 kcal/mole) is explained by introducing a special incorporation equilibrium of phosphine bound to the silicon surface. The source materials phosphorus trichloride and phosphorus pentachloride may be incorporated with this equilibrium. Die geringere Temperaturabhängigkeit des Phosphoreinbaus bei der Verwendung vo Phosphin zusammen mit Chlorsilanen (ΔH = −13 bis −15 kcal/mol) anstelle von Silan (ΔH = −43 kcal/mol) wird erklärt durch die Einführung eines speziellen Einbaugleichgewichts von Phosphin, das an die Siliciumoberfläche gebunden ist. Die Quellenmaterialien Phosphortrichlorid und Phosphorpentachlorid ordnen sich diesem Gleichgewicht ein." @default.
- W2085087476 created "2016-06-24" @default.
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- W2085087476 date "1980-01-01" @default.
- W2085087476 modified "2023-09-25" @default.
- W2085087476 title "Temperature dependence of doping element incorporation with the chemical vapour deposition of epitaxial silicon (IV). Incorporation of phosphorus in the Si-H-Cl-lP system" @default.
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- W2085087476 doi "https://doi.org/10.1002/crat.19800150209" @default.
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