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• W2085103911 abstract "Structure and chemical compositions of the interface layer obtained after nickel deposition on silicon carbide surface and subsequent annealing have been analyzed using time-of-flight secondary ion mass spectrometry (TOF-SIMS), X-ray diffraction (XRD) and Raman spectroscopy. Nickel silicide (Ni2Si) were characterized as the main product of reaction between nickel and silicon carbide after annealing at temperatures range 700–1000 °C. Raman spectroscopy and TOF-SIMS profiling results confirmed carbon precipitation within contact layer. Obtained results indicate graphitic form of carbon and its non-uniform distribution in the contact layer. Moreover, TOF-SIMS analysis showed modification of nitrogen distribution in the contact area upon Ni/SiC contact annealing." @default.
• W2085103911 created "2016-06-24" @default.
• W2085103911 creator A5038342468 @default.
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• W2085103911 date "2012-09-01" @default.
• W2085103911 modified "2023-09-25" @default.
• W2085103911 title "Investigation of microstructure and chemical composition of Ni contacts to n-type 4H–SiC" @default.
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• W2085103911 doi "https://doi.org/10.1016/j.mseb.2012.01.012" @default.
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