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- W2085113497 abstract "Fe-doped semi-insulating (SI) InP layers have been grown using chloride vapor-phase epitaxy for the first time. Fe-doping was carried out by introducing FeCl2 to the growth region, bypassing the source region. The FeCl2 was formed by etching a pure metallic Fe source by HCl vapor. The resistivity of the SI-InP epitaxial layers was evaluated by measuring current-voltage characteristics, and a high value of 4×108 Ω cm was obtained. The semi-insulating current blocking was maintained up to an applied voltage of nearly 30 V, even at 110 °C, with a layer 4.3 μm thick." @default.
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- W2085113497 date "1987-05-01" @default.
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- W2085113497 title "Fe-doped semi-insulating InP grown by chloride vapor-phase epitaxy" @default.
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- W2085113497 doi "https://doi.org/10.1063/1.338385" @default.
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