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- W2085245625 abstract "We have investigated the interaction of SiF4 with the Si(111)(7 × 7) surface at 30 K using photoelectron spectroscopy (PES) and angular-dependent photon-stimulated desorption (PSD). Examination of the valence and Si(2p) core-level PES spectra, and the angular-dependent PSD spectra in the photon energy region near the Si(2p) edge, indicates three different types of adsorption: dissociative chemisorption, first-layer physisorption, and multilayer physisorption. The initial adsorption of SiF4 results in the formation of SiF and SiF3: the SiF species have the Si-F bond directed normal to the surface, while the bonds in SiF3 are not. For exposure above ~ 0.2 × 1015moleculescm2 first-layer physisorbed SiF4 is observed. With subsequent exposure, multilayer islands SiF4 are formed prior to complete coverage of the silicon surface. Subsequent warming of a low-temperature, multi-layer dosed SiF4-covered surface to T > 100 K results in a surface that is covered predominately by SiF and SiF3." @default.
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- W2085245625 date "1991-06-01" @default.
- W2085245625 modified "2023-09-25" @default.
- W2085245625 title "Reactions of SiF4 adsorbed on Si(111)(7 × 7) at 30 K" @default.
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- W2085245625 doi "https://doi.org/10.1016/0039-6028(91)90837-i" @default.
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