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• W2085251186 abstract "As silicon technology enters sub-20nm nodes, new materials, structures and processes are being introduced in order to continue with the advantages of dimensional scaling, e.g, 3D NAND, ReRAM, EUVL, etc. Beyond 10 nm, Si CMOS technology will remain as the mainstream. In this paper, key drivers for silicon-based nano-electronics as well as research directions will be reviewed from viewpoints of system, memory, logic and emerging Si technologies." @default.
• W2085251186 created "2016-06-24" @default.
• W2085251186 creator A5054308328 @default.
• W2085251186 date "2010-12-01" @default.
• W2085251186 modified "2023-10-14" @default.
• W2085251186 title "From the future Si technology perspective: Challenges and opportunities" @default.
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• W2085251186 doi "https://doi.org/10.1109/iedm.2010.5703274" @default.
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