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• W2085280135 startingPage "759" @default.
• W2085280135 abstract "1-12% {atomic ratio of In/(In+Sn)} indium-doped tin oxide (SnO2:In) films were successfully prepared on sapphire substrates by MOCVD method. HRTEM image showed that the obtained films were single crystalline films. The X-ray photoelectron spectroscopy showed the existence of non-stoichiometric oxide on the film surface. The Hall mobility and carrier concentration of the SnO2:In films varied with the In content increasing." @default.
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• W2085280135 date "2009-08-01" @default.
• W2085280135 modified "2023-09-25" @default.
• W2085280135 title "Single Crystalline SnO₂:In Films Prepared on Sapphire by MOCVD" @default.
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• W2085280135 doi "https://doi.org/10.4028/www.scientific.net/amr.79-82.759" @default.
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