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- W2085280700 abstract "A TeO X -based inorganic photoresist was developed for mastering utilizing heat-mode recording. We discovered that the novel organic thermal isolation film markedly improved the patterning resolution of phase change mastering. We demonstrated Blu-ray Disc read only memory (ROM) mastering with a blue laser diode, using the TeO X -based photoresist and the thermal isolation film. The jitter values of a replicated disc were less than 6% at the full range of the disc. It was also proven that the mastering system is capable of recording 80 nm L/S. In addition, the mechanism of development was clarified." @default.
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- W2085280700 date "2005-05-01" @default.
- W2085280700 modified "2023-10-18" @default.
- W2085280700 title "TeO<sub>X</sub>-Based Film for Heat-Mode Inorganic Photoresist Mastering" @default.
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- W2085280700 doi "https://doi.org/10.1143/jjap.44.3574" @default.
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