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• W2085328369 abstract "By combining nanoimprint lithography and traditional hydrothermal growth method of ZnO nanorods, vertical and well patterned ZnO nanostructures were successfully fabricated. The imprinted SU-8 resist deep trenches above the ZnO seed layer prohibit the lateral growth of ZnO nanorods. Various patterned vertical ZnO nanostructures like nanorods and nanowalls can be obtained. The improvement of photoluminescence property of ZnO nanorods was observed after removing the SU-8 resist from the substrate by O 2 reactive ion etching (RIE)." @default.
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• W2085328369 date "2010-01-01" @default.
• W2085328369 modified "2023-09-26" @default.
• W2085328369 title "Highly ordered growth of ZnO nanostructures by combination of nanoimprint lithography and hydrothermal method" @default.
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• W2085328369 doi "https://doi.org/10.1109/inec.2010.5425115" @default.
• W2085328369 hasPublicationYear "2010" @default.
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