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- W2085353991 abstract "Reactive deposition epitaxial growth of β-FeSi2 film on Si(001) has been studied by in situ observation of reflective high energy electron diffraction. Metastable strained phase was observed at initial stages. Surface roughness due to the islanding was observed during the deposition. The existed great tendency to transform the alignment of the orientation of crystallites into random as the thickness of deposited iron increased." @default.
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- W2085353991 date "1995-10-01" @default.
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- W2085353991 title "Reactive Deposition Epitaxial Growth of β-FeSi 2 Film on Si(001): in situ Observation by Reflective High Energy Electron Diffraction" @default.
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- W2085353991 doi "https://doi.org/10.1088/0256-307x/12/10/010" @default.
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