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- W2085383399 abstract "The local concentrations of point defects (vacancies and interstitials) have a significant impact on dopant diffusivities in silicon. The asymptotics of a pair of reaction-diffusion equations modeling nonequilibrium defect behavior in the limits of high interstitial injection and of large time are discussed." @default.
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- W2085383399 date "1989-08-01" @default.
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- W2085383399 title "On the Diffusion of Point Defects in Silicon" @default.
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