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- W2085439093 abstract "TiAlN/Si3N4 nano-multilayers with various Si3N4 layer thicknesses were synthesized by reactive magnetron sputtering. The composition, microstructure, and mechanical properties of the films were studied by energy dispersive X-ray spectroscopy, X-ray diffraction, scanning electron microscopy, and nanoindentation. It reveals that under the template effect of TiAlN layers in multilayers, as-deposited amorphous Si3N4 is crystallized and grows coherently with TiAlN layers when Si3N4 layer thickness is below 0.9 nm. Correspondingly, the hardness and elastic modulus of the multilayers increase abnormally and reach the maximum values of 52 and 588 GPa, respectively. With further increase in the layer thickness, Si3N4 transforms into amorphous and blocks the coherent growth of multilayers, resulting in a decrease of hardness and modulus. The remarkable hardness enhancement of multilayers is correlated to the crystallization of Si3N4, and the coherent strain in multilayers that could change the modulus of two constituents." @default.
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- W2085439093 date "2009-07-01" @default.
- W2085439093 modified "2023-09-27" @default.
- W2085439093 title "Microstructure and mechanical properties of TiAlN/Si3N4 nano-multilayers synthesized by reactive magnetron sputtering" @default.
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- W2085439093 doi "https://doi.org/10.1016/j.jallcom.2009.03.103" @default.
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