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- W2085479975 abstract "A combination of new organic photoresist films based on naphthoquinone with a conventional AFM using a tapered fibre tip as a near-field source enables the development of 'real time' dry process nano-lithography. The methodology of the adaptation of these films as well as the system configuration for a nano-scale fabrication will be described. Using these materials the exposure can be performed either by the optical near field or nano-thermal effect to achieve positive or negative lithography. Sub-wavelength gratings fabricated using this system with a variable line width down to 45 nm will be demonstrated." @default.
- W2085479975 created "2016-06-24" @default.
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- W2085479975 date "2005-04-05" @default.
- W2085479975 modified "2023-10-16" @default.
- W2085479975 title "Optical near-field and thermal nanolithography using organic dry developing photoresist" @default.
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- W2085479975 doi "https://doi.org/10.1088/0957-4484/16/6/026" @default.
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