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• W2085650553 abstract "Abstract The paper presents frequency f and temperature T p dependences of phase shift angle Θ , admittance σ and capacitance C p for the as-deposited and annealed (CoFeZr) x (CaF 2 ) (100− x ) nanocomposite films deposited by ion-beam sputtering of a compound target in a mixed argon–oxygen gas atmosphere in vacuum chamber. The studied films presented metallic FeCoZr “cores” covered with FeCo-based oxide “shells” embedded into oxygen-free dielectric matrix (fluorite). It was found for the metallic phase content within the range of 52.2 at.% ⩽  x  ⩽ 84.3 at.% in low- f region that Θ values were negative, while in the high- f region we observed the Θ o . It was obtained that the f -dependences of capacitance module displayed minimum at the corresponding frequency when the Θ ( f ) crossed its zero line Θ  = 0 o . It was also observed that the σ ( T p ) dependence displayed the occurrence of two minima that were related to the values of Θ 1  = 90° (the first minimum) and of Θ 2  = −90° (the second one). Some possible reasons of such behavior of (CoFeZr) x (CaF 2 ) (100− x ) nanocomposite films are discussed." @default.
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• W2085650553 date "2014-12-01" @default.
• W2085650553 modified "2023-09-26" @default.
• W2085650553 title "Enhancement of negative capacitance effect in (CoFeZr)x(CaF2)(100−x) nanocomposite films deposited by ion beam sputtering in argon and oxygen atmosphere" @default.
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• W2085650553 doi "https://doi.org/10.1016/j.jallcom.2013.12.125" @default.
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