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• W2085654988 abstract "We present two effective approaches to improve the responsivity of high speed waveguide-based Ge photodetectors integrated on a 0.25 μm silicon-on-insulator (SOI) platform. The main cause of poor responsivity is identified as metal absorption from the top contact to Ge. By optimizing Ge thickness and offsetting the contact window, we have demonstrated that the responsivity can be improved from 0.6A/W to 0.95 A/W at 1550 nm with 36 GHz 3 dB bandwidth. We also demonstrate that a wider device with double offset contacts can achieve 1.05 A/W responsivity at 1550 nm and 20 GHz 3 dB bandwidth." @default.
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• W2085654988 date "2011-05-20" @default.
• W2085654988 modified "2023-10-11" @default.
• W2085654988 title "36 GHz submicron silicon waveguide germanium photodetector" @default.
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• W2085654988 doi "https://doi.org/10.1364/oe.19.010967" @default.
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