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- W2085671055 abstract "Hydrogen concentration and diffusion in silicon nitride thin film is of significant interest because of its importance in barrier, sensor and catalytic coating applications. In this study, a novel method based on potential–pH response measurement was used to determine hydrogen diffusion in silicon nitride thin films. Hydrogen diffusion coefficient of silicon nitride films obtained from this method was 1×10−19 cm2/s. The unique feature of the potential–pH response method is its relatively simple experimental procedure, which eliminates complications arising from surface related effects and/or presence of hydrogen traps in the metal. The method also offers a considerable reduction in test time." @default.
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- W2085671055 date "2002-11-01" @default.
- W2085671055 modified "2023-09-23" @default.
- W2085671055 title "Hydrogen diffusion coefficient of silicon nitride thin films" @default.
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- W2085671055 doi "https://doi.org/10.1016/s0169-4332(02)00934-0" @default.
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