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• W2085698730 abstract "A family of heteroleptic aluminum compounds were synthesized as potential precursors for aluminum oxide deposition by atomic layer deposition (ALD). The synthesis and thermal chemistry were considered in the context of precursor selection, and [MeC(NiPr)2]AlEt2 was selected as a precursor. It was used to deposit aluminum oxide with a high growth rate (2.3−2.7 Å/cycle) at 175 °C, and the films were found to be uniform and smooth (4.71 Å rms roughness)." @default.
• W2085698730 created "2016-06-24" @default.
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• W2085698730 date "2008-11-06" @default.
• W2085698730 modified "2023-10-03" @default.
• W2085698730 title "Atomic Layer Deposition of Aluminum Oxide Thin Films from a Heteroleptic, Amidinate-Containing Precursor" @default.
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• W2085698730 doi "https://doi.org/10.1021/cm802195b" @default.
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