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- W2085706926 abstract "The high recrystallization velocities attained in the pulsed-laser annealing of ion-implanted semiconductors lead to remarkable nonequilibrium segregation effects. Detailed studies of these effects and the physical mechanisms which underlie them require control of the recrystallization velocity over a wide range. In this letter, the results of computer calculations are used to demonstrate three methods for controlling the regrowth velocity in Si and to indicate the range of velocities which may be expected by the methods." @default.
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- W2085706926 date "1981-03-15" @default.
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- W2085706926 title "Control of melt‐front velocity during pulsed laser annealing" @default.
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- W2085706926 doi "https://doi.org/10.1063/1.92382" @default.
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