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• W2086019810 abstract "Xenon adsorption on stepped Ni(hk0) faces has been studied by LEED, photoemission and work function measurements. The dipole moment per step atom, measured on the clean surfaces, has been found equal to 0.2 D. The step sites have been evidenced on Ni(810) by xenon adsorption: an increase of the binding energy of the Xe 5p12 level of about 700 meV is reported between the terrace and the step adsorption sites. On Ni(410) and Ni(310) no terrace sites have been observed. The adsorption is dominated by the steps and two types of xenon adsorption sites have been evidenced. It is assumed that the potential associated with the step edges in the case of narrow terraces presents a lateral extension of the same order of magnitude as the xenon probe diameter." @default.
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• W2086019810 date "1992-07-01" @default.
• W2086019810 modified "2023-09-29" @default.
• W2086019810 title "Adsorption of xenon on stepped nickel (hk0) surfaces by LEED and photoemission" @default.
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• W2086019810 doi "https://doi.org/10.1016/0039-6028(92)90089-o" @default.
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