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- W2086451915 abstract "We report the first demonstration of in situ electrical biasing and resistive switching of TiO 2-based RRAM while observing oxygen vacancy migration under the TEM. Specifically, repeated extension and retraction of Wadsley defects due to the migration of oxygen vacancies was observed to be concurrent with the SET and RESET processes (respectively) in the hysteretic I-V behavior of single-crystal TiO 2 devices. Additionally, structural evolution within a 20 nm size grain was observed during SET processes in ALD-grown TiO 2 devices using STEM HAADF imaging." @default.
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- W2086451915 date "2014-06-01" @default.
- W2086451915 modified "2023-09-27" @default.
- W2086451915 title "In situ biasing TEM investigation of resistive switching events in TiO<inf>2</inf>-based RRAM" @default.
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- W2086451915 doi "https://doi.org/10.1109/irps.2014.6860680" @default.
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