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- W2086482731 abstract "A carbon film vapour deposited on to Si surfaces can be detached by dissolving the `natural' surface oxide film. This oxide film is extremely thin, so that its dissolution practically has no deleterious effect on the surface features of the Si sample. Since the oxide film rapidly forms again after exposure of the sample to air, the replicating process can be repeated several times without a detectable deterioriation of the sample surface." @default.
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- W2086482731 date "1964-08-01" @default.
- W2086482731 modified "2023-10-18" @default.
- W2086482731 title "A non-destructive direct carbon-replica method for examination of si surfaces" @default.
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- W2086482731 doi "https://doi.org/10.1088/0950-7671/41/8/121" @default.
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