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W2086582440 abstract "We have designed and analyzed a novel (to the best of our knowledge) two-beam interference lithography system for large-area (wafer-level) nanopatterning with enhanced tunability of pattern periodicities. The tunable feature has been achieved by placing two rotational mirrors in the expanded beam paths at regulated angles for a desired period. Theoretical analyses show that the effective pattern coverage area greater than a 4 in. (10 cm) wafer scale is attainable with a 325 nm (30 cm coherence length) HeCd laser and 4 in. (10 cm) mirrors, while the pattern coverage area is restrained by the overruling effects between the optical coherence and mirror size. The experimental results also demonstrate uniform nanopatterns at varying periods (250–750 nm) on 4 in. (10 cm) substrates, validating the theoretical analyses. The tunable two-mirror interferometer will offer a convenient and robust way to prepare large-area nanostructures on a wafer scale with superior tunability in their pattern periodicities." @default.
W2086582440 created "2016-06-24" @default.
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W2086582440 date "2011-08-11" @default.
W2086582440 modified "2023-09-23" @default.
W2086582440 title "Tunable two-mirror interference lithography system for wafer-scale nanopatterning" @default.
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W2086582440 doi "https://doi.org/10.1364/ol.36.003176" @default.
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