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- W2086626078 abstract "Etec Systems, the Mask Business Group of Applied Materials, is in a unique position within the mask making industry - Etec has the opportunity to integrate individual parts of the overall mask manufacturing process to provide a more complete solution. Here we present the integration of the DUV ALTA laser pattern generator and the Tetra TM photomask etch system with advanced CAR resist processes. Dry etch process effects of flow, overetch, and oxygen content (in a Cl 2 /O 2 /He plasma) are discussed for the baseline POR resist in terms of etch rate, selectivity, etch bias, CD uniformity and micro-loading; the optimized etch process space was then implemented for advanced CAR resists. Iso-dense bias, football pattern loading and other pattern transfer results influencing mask manufactureability are also presented. Within the synthesis and optimization of the pattern generation system, process, and dry etch sub 13 nm range process uniformity has been achieved. The integrated ALTA / Tetra / Advanced-CAR solution set is characterized on both Etec test patterns and customer demonstrations." @default.
- W2086626078 created "2016-06-24" @default.
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- W2086626078 date "2003-12-15" @default.
- W2086626078 modified "2023-09-23" @default.
- W2086626078 title "Integration and optimization of the DUV ALTA pattern generation system using a CAR process with the Tetra photomask etch system" @default.
- W2086626078 doi "https://doi.org/10.1117/12.485622" @default.
- W2086626078 hasPublicationYear "2003" @default.
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