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- W2086793540 abstract "The carrier concentration homogeneity in a semiconductor can be quantitatively measured from the position of the plasma edge. This has been demonstrated for an InAs sample for which changes of homogeneity of about 0.5% have been measured. This plasma edge method for measuring carrier concentration inhomogeneities is at least an order of magnitude more sentitive than other methods reported to date and can be applied for any semiconductor that has a well-defined plasma edge." @default.
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- W2086793540 title "Quantitative Measurement of Semiconductor Homogeneity from Plasma Edge" @default.
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- W2086793540 doi "https://doi.org/10.1063/1.1728995" @default.
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