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• W2086829320 abstract "The electrical resistance as a function of temperature has been measured for both pure and nitrogen-doped β-Ta films over the temperature range 2°−300 °K. A calibrated Auger spectroscopy system was used to analyze the film samples quantitatively for dopant and impurity concentration. The undoped film samples were prepared under conditions expected to give a high degree of purity. These samples had resistance versus temperature curves characterized by a broad maximum occuring between 100° and 250 °K and a small but well-defined resistance minimum at 15 °K. A resistance minimum effect in tantalum has not been reported previously. Adding nitrogen to the films by reactive sputtering tended to reduce the temperature at which the maximum occurred (in films from a given system), but did not affect the temperature of the minimum. Detailed data on the resistance minimum showed that below 10 °K the resistance ha d a logarithmic temperature dependence, indicating the possibility of magnetic scattering (the Kondo effect). Analysis of the films for potentially magnetic impurities revealed that Fe was present in an amount between 10 and 50 ppm." @default.
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• W2086829320 date "1974-09-01" @default.
• W2086829320 modified "2023-09-25" @default.
• W2086829320 title "Electrical resistance as a function of temperature in pure and doped beta-tantalum films" @default.
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• W2086829320 doi "https://doi.org/10.1016/0040-6090(74)90240-5" @default.
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