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- W2086897280 abstract "Adsorption and desorption of hydrogen on a Si(100) surface have been investigated by time-of-flight type electron stimulated desorption spectroscopy (TOF-ESD). The ESD proton yield increases initially and decreases after taking a maximum at 500 L (langmuir) against the atomic hydrogen exposure at room temperature, while it increases linearly with the molecular hydrogen exposure. Threshold energies of an incident electron for proton desorption are measured for several surface conditions. Threshold energies are 20 eV for 360 L atomic hydrogen and 26 eV for 1760 L atomic hydrogen which induces a structure change to (1 × 1). The threshold energy for 2560 L molecular hydrogen is 20 eV. From the characteristics of 2 eV peak component in the kinetic energy distribution of desorbed protons, it is suggested that the threshold energies only depend on the life time of localized surface excitonic states." @default.
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- W2086897280 date "1993-03-01" @default.
- W2086897280 modified "2023-09-24" @default.
- W2086897280 title "Desorption study of a proton from H/Si(100) by electron stimulated desorption spectroscopy" @default.
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- W2086897280 doi "https://doi.org/10.1016/0039-6028(93)90979-t" @default.
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