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• W2086923551 startingPage "95" @default.
• W2086923551 abstract "Annealing ZnO films prepared by ion-beam-assisted deposition (IBAD) in air above 773 K can change the resistivity from ≈10−4Ω cm to more than 106Ω cm, changing the films from a highly degenerate transparent material to a thermally activated semiconductor. No change in the transmission through the visible region of the spectrum (more than 90%) is observed but the optical band gap can change from ≈3.41 to ≈3.24 eV, as a result of a Burstein-Moss shift. However, for films that are not initially very transparent, the average transmission can be increased from ≈28% to more than 85%. High temperature annealing increases the average size of crystallites by ≈15%. After annealing, a large photoresponse is observed, with the conductivity increasing by more than a factor of 105 when the film is illuminated with UV light (≈4 × 1016 photons cm−2 s−1). The rise and decay time constants are very large, indicating that previously reported surface structural changes occur. These constants strongly depend on the intensity of the light and the ambient gases present. Any true photoconductivity present appears to be very small. Encapsulating the free surface of a ZnO film with a layer of amorphous SiNx can help to stabilize the film, and it decreases the photoresponse time as well as the magnitude of the photoresponse." @default.
• W2086923551 created "2016-06-24" @default.
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• W2086923551 date "1994-01-01" @default.
• W2086923551 modified "2023-10-16" @default.
• W2086923551 title "Effects of annealing ZnO films prepared by ion-beam-assisted reactive deposition" @default.
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• W2086923551 doi "https://doi.org/10.1016/0040-6090(94)90655-6" @default.
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