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- W2086959905 abstract "a-SiC:H samples over the entire compositional range have been deposited by using 13.56 MHz radio frequency chemical vapor deposition (RF-CVD) with C2H2 carbon source and electron cyclotron resonance chemical vapor deposition with C2H4 source. Films with the largest deposition rates have been obtained in the C-rich regime with defect density ∼1017 cm−3. Compositional, optical, structural and radiative emission properties have been investigated and correlated for specimens obtained from both deposition techniques." @default.
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- W2086959905 date "1998-05-01" @default.
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- W2086959905 title "Wide band gap a-SiC:H films for optoelectronic applications" @default.
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