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- W2087329820 abstract "Quantitative analysis of the collapse property of dot resist pattern formed by ArF excimer laser lithography ranging from 141 to 405 nm diameter and 360 nm height is demonstrated experimentally. By directly applying a load to a top corner of the resist pattern with a microcantilever tip, a resist dot pattern adhering on a substrate can be collapsed easily accompanying slight residue formation. The load required for pattern collapse decreases with decreasing pattern diameter. In combination with an analysis of the internal stress distribution in the resist pattern, destruction mechanisms and the diameter dependency of pattern collapse can be clarified." @default.
- W2087329820 created "2016-06-24" @default.
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- W2087329820 date "2001-09-01" @default.
- W2087329820 modified "2023-09-27" @default.
- W2087329820 title "Analysis of pattern collapse of ArF excimer laser resist by direct peeling method with atomic force microscope tip" @default.
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- W2087329820 doi "https://doi.org/10.1016/s0167-9317(01)00452-x" @default.
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