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- W2087568764 abstract "A facility is presented that combines a commercial ion-implanter and a specially designed end-station. This consists of a He-cryostat combined with a powerful heater so that a temperature range from 4 to 1270 K is accessible. The sample holder allows measurement of the resistance of the sample during implantation. Finally, a complete Guinier geometry allows in-situ X-ray diffraction studies of the implanted specimens. Two examples of in-situ measurements of phase formation during ion implantation by X-ray diffraction and the transformed fraction versus ion fluence derived from the changes of the resistivity are demonstrated." @default.
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- W2087568764 date "1996-10-01" @default.
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- W2087568764 title "Equipment for in-situ X-ray diffraction and resistance measurements during ion implantation at temperatures between 4 and 1270 K" @default.
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- W2087568764 doi "https://doi.org/10.1016/s0257-8972(95)02743-2" @default.
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