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- W2087772802 abstract "In this work we present a series of experimental results performed in Silicon-On-Insulator material, where Oxidation Stacking Faults are used to monitor the silicon interstitial distribution after an oxidation process. These results demonstrate that the lateral distribution of these point defects show an important decrease as compared with bulk silicon. This decrease mostly depends on the thickness of the Si overlayer. Comparison with simulation reveals fundamental properties of Si interstitials." @default.
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- W2087772802 date "1995-06-01" @default.
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- W2087772802 title "Decrease of the lateral distribution of interstitials in Silicon-On-Insulator structures" @default.
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- W2087772802 doi "https://doi.org/10.1016/0167-9317(95)00098-s" @default.
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