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- W2087832009 abstract "A non-alloyed Pd/GeTFi/Pt ohmic contact for an n-GaAs has been investigated. The specific contact resistance was 4.7x10<sup>-7</sup>Ω.cm<sup>2</sup> for an n-GaAs film which was doped to 2x10<sup>18</sup> <sup>-3</sup>.Auger depth profile showed that the interface between the contact and n-GaAs was abrupt. There was almost no change of Auger depth profiles before and after the sample was put in the furnace for 20 hours at 300 °C in an N<sub>2</sub> ambient Scanning electron microscopy showed that the contact surface was very smooth after a 400 °C , 15 second anneal. Auger depth profiles and contact resistance measurements showed that the contacts begin to deteriorate when the rapid thermal annealing time exceeds 35seconds." @default.
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- W2087832009 date "1992-05-12" @default.
- W2087832009 modified "2023-09-23" @default.
- W2087832009 title "Nonalloyed Pd/Ge/Ti/Pt ohmic contact for the high-power optical switch" @default.
- W2087832009 doi "https://doi.org/10.1117/12.59066" @default.
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