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- W2087914664 abstract "Ultrafast dynamic ellipsometry, a technique that probes a sample with chirped laser pulses at two angles and with two orthogonal polarizations, was used to measure the effective refractive index across the ablation region of a Si(111) wafer exposed to a 100 fs ablation pulse. The resulting refractive index data show a significant increase in the extinction coefficient, indicative of the melting of silicon." @default.
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- W2087914664 date "2008-05-08" @default.
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- W2087914664 title "Ultrafast dynamic ellipsometry of laser ablated silicon" @default.
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- W2087914664 doi "https://doi.org/10.1117/12.782739" @default.
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