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• W2087989127 abstract "The highest efficiency silicon solar cells are fabricated using defined texturing schemes by applying etching masks. However, for an industrial production of solar cells the usage of photolithographic processes to pattern these etching masks is too consumptive. Especially for multicrystalline silicon, there is a huge difference in the quality of the texture realized in high efficiency laboratory scale and maskless industrial scale fabrication. In this work we are describing the topography of a desired texture for solar cell front surfaces. We are investigating UV-nanoimprint lithography (UV-NIL) as a potential technology to substitute photolithography and so to enable the benefits resulting of a defined texture in industrially feasible processes. Besides the reduced process complexity, UV-NIL offers new possibilities in terms of structure shape and resolution of the generated etching mask. As mastering technology for the stamps we need in the UV-NIL, interference lithography is used. The UV-NIL process is conducted using flexible UV-transparent stamps to allow a full wafer process. The following texturisation process is realized via crystal orientation independent plasma etching to tap the full potential of the presented process chain especially for multicrystalline silicon. The textured surfaces are characerised optically using fourier spectroscopy." @default.
• W2087989127 created "2016-06-24" @default.
• W2087989127 creator A5022215390 @default.
• W2087989127 creator A5030117807 @default.
• W2087989127 creator A5035734103 @default.
• W2087989127 creator A5061213178 @default.
• W2087989127 creator A5077075475 @default.
• W2087989127 creator A5078546175 @default.
• W2087989127 creator A5089044427 @default.
• W2087989127 date "2010-04-30" @default.
• W2087989127 modified "2023-09-29" @default.
• W2087989127 title "Nanoimprint lithography for solar cell texturisation" @default.
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