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- W2088031163 abstract "The demand for fine metal-patterning techniques has increased to include fabrication of a range of next-generation devices, such as nano-scale electrodes, as well as plasmon photonic and optical devices. In addition, a plastic substrate is strongly desired for these devices because of its transparency, flexibility, lightness and low cost. Moreover, a technique offering higher throughput is required for the fabrication of large devices at low cost. In order to achieve simultaneously high resolution and high throughput, we have developed a three-dimensional metal-pattern nanoimprint technique that uses a metal oxide release layer. In this study, a metal pattern nanoimprint technique using a roll mold that produces a seamless nano-pattern with an ultraviolet curable resin was examined to obtain rapidly a nano-scale metal pattern on a plastic substrate. The seamless roll mold was fabricated by a direct writing method using an electron beam. As a result, a seamless metal nano pattern on a plastic substrate was obtained by roll-to-roll metal nanoimprinting with a metal oxide release layer." @default.
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- W2088031163 date "2011-08-01" @default.
- W2088031163 modified "2023-09-27" @default.
- W2088031163 title "Fabrication of the metal nano pattern on plastic substrate using roll nanoimprint" @default.
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- W2088031163 doi "https://doi.org/10.1016/j.mee.2011.02.006" @default.
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