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• W2088104963 abstract "Surface morphologies of the laser-etched silicon were studied as a function of the laser power densities. Scanning electron microscope (SEM) results show that different kind of microstructures develop. Pores like structures are formed at low laser power density and pillar like structures are obtained at higher laser power density. It is the etching rate, which is responsible for the surface morphology reconstructions. Etching rate was found to be a function of the laser power density. Atomic force microscope (AFM) results reveal that macro and microsurface morphology reconstructions take place simultaneously as a result of increasing etching rate. Macrosurface morphology reconstruction takes place on the silicon wafer surface and the microsurface morphology reconstruction takes place inside the pore wall." @default.
• W2088104963 created "2016-06-24" @default.
• W2088104963 creator A5015324937 @default.
• W2088104963 creator A5060821849 @default.
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• W2088104963 date "2008-04-01" @default.
• W2088104963 modified "2023-09-23" @default.
• W2088104963 title "Macro and microsurface morphology reconstructions during laser-induced etching of silicon" @default.
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• W2088104963 doi "https://doi.org/10.1016/j.micron.2007.04.005" @default.
• W2088104963 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/17517515" @default.
• W2088104963 hasPublicationYear "2008" @default.
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