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- W2088810010 abstract "The steady-state oxygen surface content in oxygen sputtered silicon is calculated as well as other related quantities. The span of sputtering conditions includes energies from 0.5 to 14.5 keV and incidence angles over the critical angle for oxygen bombardment induced silicon dioxide formation. Data on surface oxidation level, sputtering yield, oxygen content of the mixing layer and critical angle are quantitatively related each other in a quite simple framework." @default.
- W2088810010 created "2016-06-24" @default.
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- W2088810010 date "2002-09-26" @default.
- W2088810010 modified "2023-09-29" @default.
- W2088810010 title "Angular dependence of the steady-state oxygen surface content in oxygen sputtered silicon at several impact energies" @default.
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- W2088810010 doi "https://doi.org/10.1016/s0042-207x(02)00219-1" @default.
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