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- W2089582308 abstract "Ferromagnetic resonance has been used to investigate the magnetization relaxation in trilayers of Ag(t)/NiFe(10 nm)/Ag(t), sputter deposited on Si(001) where the thickness of the Ag layer varied from 0 nm to 24 nm. In the first stages of formation, the Ag layers form islands that work as mold to imprint defects or inhomogeneities on the NiFe film surface. The magnetic inhomogeneities and defects imprinted on the surface of the NiFe film act as extrinsic sources of magnetization relaxation in addition to the intrinsic Gilbert damping mechanism. Weak inhomogeneities are associated to the two-magnon scattering source and the strong inhomogeneities are associated to the fluctuations of the local magnetization. By adding the three different sources of magnetization damping, we were able to explain the azimuthal dependence of the ferromagnetic resonance linewidth." @default.
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- W2089582308 date "2013-07-09" @default.
- W2089582308 modified "2023-10-17" @default.
- W2089582308 title "Strong magnetization damping induced by Ag nanostructures in Ag/NiFe/Ag trilayers" @default.
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- W2089582308 doi "https://doi.org/10.1063/1.4812564" @default.
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