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• W2090004768 abstract "Reports a new self-aligned process to form gated field emitters including an evaluation of dielectrics and field emission measurements. This process offers advantages including gate opening control down to 0.25 mu m diameter without electron-beam writing assistance, a planar structure, and thick dielectric for capacitance reduction. The current-voltage characterization of the gated field emitter follows Fowler-Nordheim behavior. Leakage characteristics of various dielectric materials are measured and described." @default.
• W2090004768 created "2016-06-24" @default.
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• W2090004768 date "1992-03-01" @default.
• W2090004768 modified "2023-09-23" @default.
• W2090004768 title "Fabrication of self-aligned gated field emitters" @default.
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• W2090004768 doi "https://doi.org/10.1088/0960-1317/2/1/005" @default.
• W2090004768 hasPublicationYear "1992" @default.
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