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• W2090087215 abstract "Key features are presented of two high-resolution EUV imaging tools: the MS-13 Microstepper wafer exposure and the RIM-13 reticle imaging microscope. The MS-13 has been developed for EUV resist testing and technology evaluation at the 32nm node and beyond, while the RIM-13 is designed for actinic aerial image monitoring of blank and patterned EUV reticles. Details of the design architecture, module layout, major subsystems and performance are presented for both tools." @default.
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• W2090087215 date "2005-05-06" @default.
• W2090087215 modified "2023-10-11" @default.
• W2090087215 title "High-resolution EUV imaging tools for resist exposure and aerial image monitoring" @default.
• W2090087215 cites W1973690901 @default.
• W2090087215 doi "https://doi.org/10.1117/12.606715" @default.
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