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- W2090117944 abstract "The present study describes a method enabling the metal-induced lateral crystallization (MILC) of amorphous silicon (a-Si) films. Glass substrates coated with a-Si films were contacted with ground nickel sheets under compressive stresses ranging from 3.7 to 265.8 MPa at 550 °C for 1 h. Subsequently, the nickel sheet and stress were removed and the specimens were annealed at 550 °C for 1 to 4 h. The experimental results indicate that the extent of MILC decreased when the preliminary compressive stress was increased, while all specimens exhibited the same rate of lateral crystallization during annealing. The present study indicates that, by applying an appropriate compressive stress (~ 4 MPa), an effective method to reduce the residual Ni content in polycrystalline silicon (poly-Si) can be obtained. ► Apply compressive stress on α-Si thin film by direct mechanical contact of Ni sheet. ► MIC thickness increased with increasing compressive stress after seeding step. ► This method showed effective to reduce the residual Ni in poly-Si when annealing." @default.
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- W2090117944 date "2012-01-01" @default.
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- W2090117944 title "Effect of compressive stress on nickel-induced lateral crystallization of amorphous silicon thin films" @default.
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- W2090117944 doi "https://doi.org/10.1016/j.tsf.2011.11.041" @default.
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