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- W2090424662 abstract "A Computational Fluid Dynamics (CFD) code is used to determine the potential benefit of pulsed Metal-Organic Chemical Vapor Deposition (MOCVD). When AlN is grown using MOCVD over a range of pressures (30 to 270 Torr) and substrate temperatures (400°C to 900°C), gas-phase mixing of the precursor (TMA1) and ammonia hydride (NH<sub>3</sub>)leads to adduct formation. This adduct formation may produce some undesired particulate by-products and deplete the precursors at elevated pressure and temperature. In order to reduce this gas-phase parasitic reaction, the pulsed inlet condition as proposed by Bachmann et al. is utilized to effectively separate the precursor form ammonia in gas- phase. It is predicted that for high reactor pressure (270 Torr), the growth efficiency of AlN can be enhanced by a factor of 3 through the pulsed MOCVD technique while simultaneously reducing the particle formation. The improvement by pulsed MOCVD is also demonstrated for a proposed 3D (North Carolina State University) research reactor." @default.
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- W2090424662 date "1999-07-06" @default.
- W2090424662 modified "2023-09-23" @default.
- W2090424662 title "CFD simulation of pulsed MOCVD to reduce gas-phase parasitic reaction" @default.
- W2090424662 doi "https://doi.org/10.1117/12.351300" @default.
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