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- W2090430113 abstract "Abstract We propose a technique for growing a multilayered superlattice consisting of several monolayers of CaF 2 /CdF 2 on a Si(111) substrate using a partially ionized beam technique at 50°C. This technique should be suitable for use in Si based quantum effect devices using CaF 2 , CdF 2 , and CoSi 2 heterostructures on a Si substrate. Ionization and acceleration were performed for CaF 2 evaporation to reduce the required growth temperature using a partially ionized CaF 2 molecular beam generated by electron bombardment. The surface morphology and sharpness of the heterointerface were improved by the proposed technique as demonstrated by atomic force microscopy, the lattice image of transmission electron microscopy and satellite peaks of X-ray diffractometory." @default.
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- W2090430113 date "1998-07-01" @default.
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- W2090430113 title "Epitaxial growth of nanometer-thick CaF2/CdF2 heterostructures using partially ionized beam epitaxy" @default.
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- W2090430113 doi "https://doi.org/10.1016/s0038-1101(98)00083-5" @default.
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