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• W2090433900 abstract "Small-angle X-ray scattering is applied to investigate the microstructure and the morphology of three photoluminescent porous silicon samples of the same porosity (80%) but prepared using different electrochemical treatments: (A) as-prepared, (B) as-prepared 65% porosity, followed by an oxidation treatment and an oxide dissolution in HF, (C) as-prepared 65% porosity followed by a HF dissolution. Although the PL spectra are almost similar in energy, there are differences in their intensities: the luminescence intensity of the as-prepared sample A is a bit greater than the one observed for sample B and much more greater than the one corresponding to sample C. If one assumes the same surface passivation (Si-H) for the three samples then these differences in luminescence intensity may be due to the different PS morphologies which are evidenced in SAXS curves at low q values." @default.
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• W2090433900 date "1995-07-01" @default.
• W2090433900 modified "2023-09-23" @default.
• W2090433900 title "Correlation between the Porous Silicon Morphology and the Photoluminescence Efficiency" @default.
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• W2090433900 doi "https://doi.org/10.1002/pssb.2221900110" @default.
• W2090433900 hasPublicationYear "1995" @default.
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