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- W2090826627 abstract "This paper evaluates two treatment processes to reduce HBr in plasma etch reactor. The bromine concentration is measured by a total X-Ray fluorescence (TXRF) technique. The first treatment is based on an outgassing effect by heating and the second on a plasma etch surface treatment. Both treatments can lead to a reduction by a factor 20 of the bromine concentration. The electrical impact of the plasma needs to be evaluated." @default.
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- W2090826627 date "2014-05-01" @default.
- W2090826627 modified "2023-09-26" @default.
- W2090826627 title "Surface treatment against bromine defectivity in plasma etch reactor" @default.
- W2090826627 doi "https://doi.org/10.1109/asmc.2014.6847030" @default.
- W2090826627 hasPublicationYear "2014" @default.
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