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- W2090965478 abstract "Abstract In this paper we report sheet resistance and junction depth measurements on samples implanted with low-energy BF2+ ions and annealed in a standard furnace tube. As shown by results on samples annealed at 600°C, channeling effects do not significantly affect boron implantation profiles. The behavior of the junction depth is studied as a function of energy (5–40 keV), dose (1014 to 3 × 1015/cm2) and annealing temperature. BF2+ implantation can produce 0.2 μm junctions with relatively low sheet resistance ( r□ = 200 Ω ) provided the annealing temperature does not exceed 850°C." @default.
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- W2090965478 date "1985-05-01" @default.
- W2090965478 modified "2023-09-28" @default.
- W2090965478 title "Low-energy BF2+ implants" @default.
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- W2090965478 doi "https://doi.org/10.1016/0168-583x(85)90301-5" @default.
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