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- W2090995134 abstract "Plasma CVM (chemical vaporization machining) and EEM (elastic emission machining) systems were developed for coherent X-ray optics fabrication. Figure-correction performances were tested in the spatial wavelength range from submillimeter to several hundreds mm, and those processes were certified to be promising technique to fabricate next-generation mirrors for coherent X-ray beams. A wave-optics simulation code was also developed to feed scientific analysis back to the fabrication technology. A figure measurement technique was also proposed to satisfy the suggestions from the wave-optics simulations. Simulated results indicated the necessity of the figure measurement with subnanometer accuracy having lateral resolution more than submillimeter." @default.
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- W2090995134 date "2001-11-14" @default.
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- W2090995134 title "Development of plasma chemical vaporization machining and elastic emission machining systems for coherent x-ray optics" @default.
- W2090995134 doi "https://doi.org/10.1117/12.448496" @default.
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