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• W2091039028 abstract "We demonstrate dopant profiling in ultrathin channels (UTCs) ( T c =18–58 nm) of vertical-type double-gate metal-oxide-semiconductor field-effect-transistors (DG MOSFET) by scanning nonlinear dielectric microscopy (SNDM). The vertical UTCs were fabricated by orientation-dependent-wet etching. Using ion implantation technology and subsequent furnace annealing, n + -p junctions, which correspond to the source/drain of the vertical-type DG MOSFET, were formed in the upper part of the UTC. To improve the accuracy of the vertical dopant profile in the UTC, the cross-section of the UTC was magnified by beveling with a small angle by chemical mechanical polishing. Using such a beveled sample, the dopant depth profile in the vertical UTC has been measured by SNDM with nanometer-scale resolution. On the basis of the measurements of the dopant profile, an effective channel length for the vertical DG MOSFET has also been estimated quantitatively." @default.
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• W2091039028 date "2005-04-01" @default.
• W2091039028 modified "2023-09-23" @default.
• W2091039028 title "Demonstration of Dopant Profiling in Ultrathin Channels of Vertical-Type Double-Gate Metal-Oxide-Semiconductor Field-Effect-Transistor by Scanning Nonlinear Dielectric Microscopy" @default.
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• W2091039028 doi "https://doi.org/10.1143/jjap.44.2400" @default.
• W2091039028 hasPublicationYear "2005" @default.
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